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Auxiliary Eqpt.

Ceramic Component Cleaning Machine

Fully Automatic Operation: The robotic arm automatically handles workpieces, and the in-tank process flows operate automatically without human intervention during processing.

Acid Tank Cleaning: Using chemical solutions with a circulation and filtration system to clean the surfaces of ceramic components.

Chemical Solution Recycling: After processing, the chemical solution is filtered and stored in a reservoir for reuse in subsequent cycles.

Water Tank Cleaning: Features rapid water filling (within 1 minute), slow overflow (2-10 L/min to remove contaminants), high-pressure spraying (adjustable pressure 0.3-1.2 MPa), bottom nitrogen bubbling (adjustable flow rate 10-100 L/min), and rapid drainage (emptying within 10 seconds) to meet various workpiece process requirements.

Water-Saving Function: DIW from slow overflow and spraying can be collected via a recycling pipeline into a pure water tank for reuse in subsequent fillings, significantly conserving DIW.

Drying Function: Utilizing high-temperature N₂ gas combined with in-tank infrared heating tubes for drying.

Flexible Process Design: Allows for multiple process recipes to be set up on the equipment, with easy and rapid modifications.

Multi-Level User Process Database: Available for user access and storage.

产品详情

The Ceramic Component Cleaning Machine is a specialized device primarily used in semiconductor manufacturing for cleaning high-hardness, high-gloss, and porous materials. It ensures surfaces are free from contaminants to meet the stringent cleanliness requirements of semiconductor fabrication.

Surface cleaning is performed using chemical solutions combined with deionized water (DIW) immersion and high-pressure water spraying, effectively removing particles larger than 0.2μm with a removal rate exceeding 95%. It supports automated control of parameters such as time, temperature, and flow rate. Additionally, it incorporates ultrasonic cleaning, generating cavitation effects in the cleaning solution through high-frequency vibrations, forming millions of micrometer-sized bubbles that produce powerful impact forces to dislodge dirt upon bursting.

The equipment frame is constructed from Q235 carbon steel with a fluorine paint finish. The main body is clad with polypropylene (PP) panels. The structure includes an automatically operating robotic arm, in-tank rotation or oscillation mechanisms, a chemical solution circulation system, high-pressure nozzle assemblies, a workpiece lifting device, nitrogen drying pipelines, and a chemical solution recovery tank.


Cleaning CapacityVarious ceramic components (e.g.,SIC ceramics, alumina ceramics).
Solution Preparation MethodAutomatic solution preparation and replenishment.

Filtration Precision

0.05-0.2μm

Circulation Flow Rate15-30L/min
Drying Temperature60-80℃
Tank MaterialSUS316L、PVDF、NPP
Safety Protection FeaturesMotion mechanism safety interlocks, mechanical protective covers, leak detection, air pressure alarms, water pressure alarms, and airflow alarms