Fully-auto Monolithic Cleaning Machine adopts a multi-layer ca-vity structure, with a rotating brush head, two fluids, megasound and a variety of chemical liquids, which can effectively remove p-hysical particles and metal ion residues on the wafer, and is mai-nly used for the final cleaning of wafer manufacturing, post-CMP cleaning,pre-diffusion cleaning, post-etching cleaning, standard RCA, PR removal cleaning,pre- and post-coating cleaning, etc.